The Registry of Toxic Effects of Chemical Substances

Silicon fluoride

RTECS #: VW2327000

CAS #: 7783-61-1

UPDATE: May 2004 MW: 104.09 MF: F4Si


NOTE:

TABLE OF CONTENTS:
  1. SYNONYMS:
  2. ACUTE TOXICITY DATA:
  3. OTHER MULTIPLE DOSE DATA:
  4. REVIEWS:
  5. STANDARDS AND REGULATIONS:
  6. NIOSH DOCUMENTATION AND SURVEILLANCE:
  7. STATUS IN FEDERAL AGENCIES:
  8. REFERENCES:

SYNONYMS:

  1. Perfluorosilane
  2. Silane, tetrafluoro -
  1. Tetrafluorosilane


SKIN AND EYE IRRITATION DATA AND REFERENCES:

ROUTE/
ORGANISM 		DOSE
EFFECT

 REFERENCE
N/R
 N/R N/R N/R


MUTATION DATA AND REFERENCES:

SYSTEM TEST ROUTE/
ORGANISM/
TISSUE 		DOSE REFERENCE
N/R N/R N/R N/R


REPRODUCTIVE EFFECTS DATA AND REFERENCES:

ROUTE/
ORGANISM 		DOSE
EFFECT

 REFERENCE
N/R
 N/R N/R N/R


TUMORIGENIC DATA AND REFERENCES:

ROUTE/
ORGANISM 		DOSE
EFFECT

 REFERENCE
N/R
 N/R N/R N/R


ACUTE TOXICITY DATA AND REFERENCES:

ROUTE/
ORGANISM 		DOSE
EFFECT

 REFERENCE
inhalation
rat 		lethal concentration (50 percent kill): 2,272 ppm Eye: Lacrimation

Lung, Thorax, or Respiration: Acute pulmonary edema

Lung, Thorax, or Respiration: Dyspnea 		JTSCDR 18,394,1993


OTHER MULTIPLE DOSE DATA AND REFERENCES:

ROUTE/
ORGANISM 		DOSE
EFFECT

 REFERENCE
inhalation
rat 		lowest published toxic concentration: 300 ppm/5 hour/3 day- intermittent Lung, Thorax, or Respiration: Emphysema

Kidney, Ureter, and Bladder: Changes in tubules (including acute renal failure, acute tubular necrosis)

Related to Chronic Data: Death in the "MULTIPLE DOSE" data type field 		BJIMAG 27,1,1970


REVIEWS:

ORGANIZATION STANDARD
REFERENCE
American Conference of Governmental Industrial Hygienists (ACGIH) Threshold Limit Value time-weighted average 2.5 mg(F)/m3 DTLVS* TLV/BEI,1999
American Conference of Governmental Industrial Hygienists (ACGIH) Threshold Limit Value Not classifiable as a human carcinogen DTLVS* TLV/BEI,1999


STANDARDS AND REGULATIONS:

ORGANIZATION STANDARD
REFERENCE
Mine Safety and Health Administration (MSHA) STANDARD - air time-weighted average 2.5 mg(F)/m3 DTLVS* 3,116,1971
Occupational Safety and Health Administration (OSHA) Permissible Exposure Limit (General Industry) 8 hour time-weighted average 2.5 mg(F)/m3 CFRGBR 29,1910.1000,1994
Occupational Safety and Health Administration (OSHA) Permissible Exposure Limit (Construction) 8 hour time-weighted average 2.5 mg(F)/m3 CFRGBR 29,1926.55,1994
Occupational Safety and Health Administration (OSHA) Permissible Exposure Limit (Shipyards) 8 hour time-weighted average 2.5 mg(F)/m3 CFRGBR 29,1915.1000,1993
Occupational Safety and Health Administration (OSHA) Permissible Exposure Limit (Federal Contractors) 8 hour time-weighted average 2.5 mg(F)/m3 CFRGBR 41,50-204.50,1994
Occupational Exposure Limit - AUSTRALIA time-weighted average 2.5 mg(F)/m3, JAN1993
Occupational Exposure Limit - AUSTRIA MAK 2.5 mg(F)/m3, JAN1999
Occupational Exposure Limit - BELGIUM time-weighted average 2.5 mg(F)/m3, JAN1993
Occupational Exposure Limit - FINLAND time-weighted average 2.5 mg(F)/m3, JAN1999
Occupational Exposure Limit - FRANCE VME 2.5 mg(F)/m3, JAN1999
Occupational Exposure Limit - GERMANY MAK 2.5 mg(F)/m3, JAN1999
Occupational Exposure Limit - HUNGARY time-weighted average 1 mg(F)/m3, short term exposure limit 2 mg(F)/m3, JAN1993
Occupational Exposure Limit - NORWAY time-weighted average 0.6 mg(F)/m3, JAN1999
Occupational Exposure Limit - THE PHILIPPINES time-weighted average 2.5 mg(F)/m3, JAN1993
Occupational Exposure Limit - POLAND MAC(time-weighted average) 1 mg(HF)/m3, MAC(short term exposure limit) 3 mg(HF)/m3, JAN1999
Occupational Exposure Limit - SWEDEN NGV 2 mg(F)/m3, JAN1999
Occupational Exposure Limit - SWITZERLAND MAK- week 1.8 ppm (1.5 mg(F)/m3), KZG- week 3.6 ppm (3.0 mg(F)/m3), JAN1999
Occupational Exposure Limit - THAILAND time-weighted average 2.5 mg(F)/m3, JAN1993
Occupational Exposure Limit - TURKEY time-weighted average 2.5 mg(F)/m3, JAN1993
Occupational Exposure Limit - UNITED KINGDOM time-weighted average 2.5 mg(F)/m3, SEP2000
Occupational Exposure Limit IN ARGENTINA, BULGARIA, COLOMBIA, JORDAN, KOREA American Conference of Governmental Industrial Hygienists (ACGIH) Threshold Limit Value;

Not classifiable as a human carcinogen
Occupational Exposure Limit IN NEW ZEALAND, SINGAPORE, VIETNAM American Conference of Governmental Industrial Hygienists (ACGIH) Threshold Limit Value
Not classifiable as a human carcinogen


NIOSH DOCUMENTATION AND SURVEILLANCE:

ORGANIZATION STANDARD or SURVEY
REFERENCE
National Institute for Occupational Safety and Health (NIOSH) Recommended Exposure Level TO FLUORIDES, INORGANIC-air 10 hour time-weighted average 2.5 mg(F)/m3 NIOSH* DHHS #92-100,1992
National Occupational Hazard Survey 1974 National Occupational Hazard Survey 1974: Hazard Code: 84445;
Number of Industries 2;
Total Number of Facilities 46;
Number of Occupations 3;
Total Number of Employees Exposed 414
National Occupational Exposure Survey 1983 National Occupational Exposure Survey 1983: Hazard Code: 84445;
Number of Industries 4;
Total Number of Facilities 51;
Number of Occupations 5;
Total Number of Employees Exposed 2,896;
Total Number of Female Employees Exposed 394


STATUS IN FEDERAL AGENCIES:

ORGANIZATION
REFERENCE
EPA TSCA Section 8(b) CHEMICAL INVENTORY
Used in the fabrication of semiconductors, optical fibers and amorphous SILICON solar cells
EPA TSCA TEST SUBMISSION (TSCATS) DATA BASE, JANUARY 2001


REFERENCES:

CODEN
REFERENCE
BJIMAG British Journal of Industrial Medicine. (British Medical Journal, Box 560B, Kennebunkport, ME 04046) V.1- 1944-
CFRGBR Code of Federal Regulations. (U.S. Government Printing Office, Supt. of Documents, Washington, DC 20402)
DTLVS* The Threshold Limit Values (TLVs) and Biological Exposure Indices (BEIs) booklet issues by American Conference of Governmental Industrial Hygienists (ACGIH), Cincinnati, OH, 1996
JTSCDR Journal of Toxicological Sciences. (Japanese Soc. of Toxicological Sciences, 4th Floor, Gakkai Center Bldg., 4-16, Yayoi 2-chome, Bunkyo-ku, Tokyo 113, Japan) V.1- 1976-
NIOSH* National Institute of Occupational Safety and Health, U.S. Dept. of Health, Education, and Welfare, Reports and Memoranda.

Used in the fabrication of semiconductors, optical fibers and amorphous SILICON solar cells

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